Silica-Based, Organically Modified Host Material for Waveguide Structuring by Two-Photon-Induced Photopolymerization

Stefan Krivec; Nadezda Matsko; V. Satzinger; Niklas Pucher; Nicole Galler; Thomas Koch; V. Schmidt; Werner Grogger; R. Liska; H. Lichtenegger

doi:10.1002/adfm.200901790

Silica-Based, Organically Modified Host Material for Waveguide Structuring by Two-Photon-Induced Photopolymerization

Stefan Krivec
, Nadezda Matsko
, V. Satzinger
, Niklas Pucher
, Nicole Galler
, Thomas Koch
, V. Schmidt
, Werner Grogger
, R. Liska
, H. Lichtenegger

Institute of Electron Microscopy and Nanoanalysis (5190)

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	811-819
Journal	Advanced Functional Materials
Volume	20
Issue number	5
DOIs	https://doi.org/10.1002/adfm.200901790
Publication status	Published - 2010

Fields of Expertise

Advanced Materials Science

Treatment code (Nähere Zuordnung)

Basic - Fundamental (Grundlagenforschung)

Access to Document

10.1002/adfm.200901790

Nanoimprint Lithography in Austria
Grogger, W. (Project manager) & Haber, T. (Attendee / Assistant)
1/01/09 → 31/03/14
Project: Research project

Cite this

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title = "Silica-Based, Organically Modified Host Material for Waveguide Structuring by Two-Photon-Induced Photopolymerization",

author = "Stefan Krivec and Nadezda Matsko and V. Satzinger and Niklas Pucher and Nicole Galler and Thomas Koch and V. Schmidt and Werner Grogger and R. Liska and H. Lichtenegger",

note = "online",

year = "2010",

doi = "10.1002/adfm.200901790",

language = "English",

volume = "20",

pages = "811--819",

journal = "Advanced Functional Materials",

issn = "1616-3028",

publisher = "John Wiley and Sons Inc.",

number = "5",

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TY - JOUR

T1 - Silica-Based, Organically Modified Host Material for Waveguide Structuring by Two-Photon-Induced Photopolymerization

AU - Krivec, Stefan

AU - Matsko, Nadezda

AU - Satzinger, V.

AU - Pucher, Niklas

AU - Galler, Nicole

AU - Koch, Thomas

AU - Schmidt, V.

AU - Grogger, Werner

AU - Liska, R.

AU - Lichtenegger, H.

N1 - online

PY - 2010

Y1 - 2010

U2 - 10.1002/adfm.200901790

DO - 10.1002/adfm.200901790

M3 - Article

SN - 1616-3028

VL - 20

SP - 811

EP - 819

JO - Advanced Functional Materials

JF - Advanced Functional Materials

IS - 5

ER -

Silica-Based, Organically Modified Host Material for Waveguide Structuring by Two-Photon-Induced Photopolymerization

Fields of Expertise

Treatment code (Nähere Zuordnung)

Access to Document

Projects

Nanoimprint Lithography in Austria

Cite this