Fabrication of n- and p-Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self-Aligned Nanoimprinting

Ursula Palfinger; Christoph Auner; Herbert Gold; Anja Haase; Johanna Kraxner; Thomas Haber; Meltem Sezen; Werner Grogger; Georg Jakopic; Joachim R. Krenn; Barbara Stadlober

doi:10.1002/adma.201001947

Fabrication of n- and p-Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self-Aligned Nanoimprinting

Ursula Palfinger
, Christoph Auner
, Herbert Gold
, Anja Haase
, Johanna Kraxner
, Thomas Haber
, Meltem Sezen
, Werner Grogger
, Georg Jakopic
, Joachim R. Krenn
, Barbara Stadlober

Institute of Electron Microscopy and Nanoanalysis (5190)

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	5115-5119
Journal	Advanced Materials
Volume	22
DOIs	https://doi.org/10.1002/adma.201001947
Publication status	Published - 2010

Fields of Expertise

Advanced Materials Science

Treatment code (Nähere Zuordnung)

Basic - Fundamental (Grundlagenforschung)

Access to Document

10.1002/adma.201001947

Nanoimprint Lithography in Austria
Grogger, W. (Project manager) & Haber, T. (Attendee / Assistant)
1/01/09 → 31/03/14
Project: Research project

Cite this

@article{de4e974f97bc4748a255c832873436a1,

title = "Fabrication of n- and p-Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self-Aligned Nanoimprinting",

author = "Ursula Palfinger and Christoph Auner and Herbert Gold and Anja Haase and Johanna Kraxner and Thomas Haber and Meltem Sezen and Werner Grogger and Georg Jakopic and Krenn, \{Joachim R.\} and Barbara Stadlober",

year = "2010",

doi = "10.1002/adma.201001947",

language = "English",

volume = "22",

pages = "5115--5119",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

}

TY - JOUR

T1 - Fabrication of n- and p-Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self-Aligned Nanoimprinting

AU - Palfinger, Ursula

AU - Auner, Christoph

AU - Gold, Herbert

AU - Haase, Anja

AU - Kraxner, Johanna

AU - Haber, Thomas

AU - Sezen, Meltem

AU - Grogger, Werner

AU - Jakopic, Georg

AU - Krenn, Joachim R.

AU - Stadlober, Barbara

PY - 2010

Y1 - 2010

U2 - 10.1002/adma.201001947

DO - 10.1002/adma.201001947

M3 - Article

SN - 0935-9648

VL - 22

SP - 5115

EP - 5119

JO - Advanced Materials

JF - Advanced Materials

ER -

Fabrication of n- and p-Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self-Aligned Nanoimprinting

Fields of Expertise

Treatment code (Nähere Zuordnung)

Access to Document

Projects

Nanoimprint Lithography in Austria

Cite this